Three-source magnetron sputtering system for ternary alloy deposition, gradient composition films, and complex multilayer research. Engineered and configured by Virospuk for your application.
Ternary alloy research, high-entropy alloy thin films, and multi-component oxide systems demand a deposition platform with three independently controllable material sources. The triple-target magnetron sputtering coater provides exactly this — three confocally arranged magnetron cathodes with fully independent power (DC or RF), gas delivery, and shutter control, all operating within a single high-vacuum chamber. Virospuk engineers will design the cathode geometry, power ratios, and substrate rotation programme to achieve your target film composition and thickness uniformity before commissioning.
| Parameter | Specification |
|---|---|
| Sources | 3 independent magnetron cathodes — DC or RF per source (specify at order) |
| Target diameter | 2-inch per source |
| Power per source | Up to 500 W (DC or RF as specified) |
| Source geometry | Confocal arrangement — all three sources aimed at substrate centre |
| Shutter control | Independent pneumatic or manual shutter per source |
| Sample stage | Motorised rotation + substrate heating up to 400 °C optional |
| Substrate size | Up to Ø 100 mm (4-inch wafer) |
| Ultimate base pressure | ≤ 5 × 10⁻⁶ mbar |
| Gas delivery | MFC-controlled Ar + two reactive gas lines (O₂, N₂) independently |
| Control system | PLC touchscreen — programmable power ramps, recipe sequencer, interlocks |
| Power input | 220 V / 50 Hz — Indian standard |
| Certifications | CE compliant |
| Warranty | 12 months from commissioning |
Contact our engineering team with your target composition system and substrate requirements to receive a configured system proposal.
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