DC magnetron sputtering coater with motorised rotating substrate stage and substrate heater to 400 °C — for crystalline, epitaxial, and high-temperature thin film growth. Configured by Virospuk.
Film microstructure, crystallinity, and phase composition are strongly dependent on substrate temperature during deposition. Amorphous films deposited at room temperature often require post-deposition annealing to achieve the desired crystal structure — introducing additional processing steps and potential contamination. Depositing at elevated substrate temperature during sputtering drives adatom surface diffusion, promoting crystalline grain growth and stoichiometric compound formation in a single deposition step. This system integrates a motorised rotating substrate stage with an in-situ substrate heater capable of reaching 400 °C — enabling direct deposition of crystalline, textured, and epitaxial thin films.
| Parameter | Specification |
|---|---|
| Deposition technique | DC magnetron sputtering with in-situ substrate heating |
| DC power supply | Up to 500 W |
| Target diameter | 2-inch |
| Substrate stage | Motorised rotation — programmable RPM for uniformity control |
| Substrate heater | Resistive heater, 25 °C to 400 °C, PID-controlled ± 2 °C |
| Substrate size | Up to Ø 100 mm (4-inch wafer) |
| Ultimate base pressure | ≤ 5 × 10⁻⁶ mbar |
| Pumping system | Turbomolecular + rotary vane backing pump |
| Process gas | Argon; reactive gas MFC optional |
| Control system | PLC touchscreen — simultaneous temperature and power recipe control |
| Power input | 220 V / 50 Hz — Indian standard |
| Certifications | CE compliant |
| Warranty | 12 months from commissioning |
Discuss your crystallinity and microstructure requirements with our process engineers — we will configure the correct substrate temperature profile and deposition parameters for your film system.
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