Specialised magnetron sputtering coater for thin film coating of electrode powders, catalyst particles, and nanomaterials. Engineered by Virospuk for battery and energy research laboratories.
Conventional magnetron sputtering systems are designed for planar substrates. However, a growing class of research problems in battery science, heterogeneous catalysis, and functional materials requires thin film deposition not onto a flat wafer but onto the surface of powder particles — carbon black, graphene, metal oxide powders, catalyst supports, and battery active material particles. This specialised powder sputtering coater addresses this challenge with an integrated vibration stage that keeps powder particles in continuous agitated motion throughout the deposition cycle, ensuring all exposed particle surfaces receive uniform film coverage.
| Parameter | Specification |
|---|---|
| Deposition technique | DC and RF magnetron sputtering (user-specified) |
| Powder stage | Vibration-agitated powder holder — continuous particle rotation during deposition |
| Target diameter | 2-inch |
| Suitable powders | Carbon black, graphene, metal oxide powders, catalyst supports, battery active materials, diamond powder |
| Ultimate base pressure | ≤ 1 × 10⁻⁵ mbar |
| Pumping system | Turbomolecular + rotary vane backing pump |
| Control system | PLC touchscreen — vibration frequency, power, and deposition time programmable |
| Power input | 220 V / 50 Hz — Indian standard |
| Certifications | CE compliant |
| Warranty | 12 months from commissioning |
Virospuk engineers will assess your powder material, required coating composition, and target film thickness before configuring the vibration stage parameters and deposition recipe.
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