Dual Zone CVD System 1200°C — Complete CVD Research System

A complete chemical vapour deposition (CVD) system configured for graphene, carbon nanotube, 2D material, and thin film growth research. Supplied as a ready-to-use integrated system including tube furnace, mass flow controllers (MFC), vacuum pump, gas manifold, and programmable touch-panel controller.

Key Specifications

• Maximum temperature: 1200°C
• Heating zones: 2 independent zones
• Process tube: Quartz or alumina, 60 mm or 100 mm diameter
• MFC channels: 4 × mass flow controllers (Ar, H2, CH4/precursor, N2)
• Vacuum pump: Rotary vane pump included — base pressure 10⁻² Pa
• Pressure measurement: Pirani gauge + capacitance manometer
• Controller: Touch-panel PLC, 30-segment programmable profiles
• Gas safety: H2 leak detector and automatic shutoff valve
• Power input: 220V / 50Hz
• Certification: CE, ISO 9001

Typical Applications

• Graphene synthesis on Cu and Ni foil substrates
• Carbon nanotube (CNT) and carbon nanofibre growth
• MoS2, WS2 and other transition metal dichalcogenide (TMD) synthesis
• SiC epitaxial growth (1400°C model)
• Boron nitride (h-BN) synthesis
• Metal organic CVD precursor experiments

Virospuk India Supply & Support

Virospuk is the authorised India distribution and integration partner for this equipment. Every unit is imported, pre-shipment inspected, and commissioned at your facility by our engineers based in Chennai. We provide GST-compliant invoicing (CGST + SGST), fixed INR pricing with no forex risk, 1-year on-site warranty, and dedicated post-installation technical support across India.