High-Purity Titanium (Ti) Metal Sputtering Target for TiN, TiO₂ and Adhesion Layer Deposition
High-purity Titanium (Ti) metal sputtering targets — the most versatile reactive sputtering target in PVD coating technology. DC reactive sputtering of Ti in N₂ atmosphere produces the widely-used golden TiN hard coating; in O₂ produces photocatalytic TiO₂; and in mixed N₂/C₂H₂ produces TiCN multi-colour hard coatings. Pure Ti films are also deposited as adhesion promotion layers between substrates and noble metal films (Ti/Au, Ti/Pt) in MEMS and medical devices.
