High-purity Tin (Sn) metal sputtering targets for DC reactive magnetron deposition of SnO₂ and FTO transparent films, and as the Sn component in ITO (In₂O₃:SnO₂) compound targets. Pure Sn films are also used as seed layers for electroplating, lead-free solder interfaces, and lithium-ion battery anode research. Sn has a low melting point (232°C) requiring careful target cooling management during sputtering.
Specifications
| Parameter | Value / Details |
|---|
| Material | Tin (Sn) — pure metal |
| Purity | 99.99% (4N) / 99.999% (5N) |
| Melting Point | 232 °C — requires active target cooling |
| Standard Sizes | Ø 50.8 mm × 3 mm / Ø 76.2 mm × 3 mm (disc) — custom sizes available |
| Custom Sizes | Rectangular, bonded — custom sizes available |
| Bonding | Cu or In backing plate — mandatory for thermal management |
| Sputtering Mode | DC magnetron (Sn films) / reactive DC (SnO₂, SnN) |
| Reactive Gases | O₂ for SnO₂ / N₂ for SnN |
| Film Applications | SnO₂ TCO, FTO electrode, solder interface, LiB anode research |
| Packaging | Vacuum-sealed bag + foam-padded box — ICP-OES purity certificate included |
| Storage | Avoid moisture contact — minor surface oxide acceptable |
| Cooling Note | Active target cooling required — Sn melts at 232 °C |
| Lead Time | 3–7 days (stock) / 10–20 days (custom) |
| Customization | In-Sn alloy (ITO alloy target), SnAg alloy, purity on request |
Trade Information
| Trade Detail | Information |
|---|
| Minimum Order Quantity | 1 Piece |
| Supply Ability | 100 Pieces Per Month |
| Delivery Time | 1–3 Weeks |
| Main Domestic Market | China |
| Export Markets | Worldwide |
| Payment Terms | T/T, L/C, Western Union, PayPal |
| Packaging | Vacuum-sealed bag + foam-padded box |
| Certification | ISO 9001 — purity certificate (ICP-OES) provided |
| Storage | Cool, dry environment — reseal after use |
| Customization | Custom size, purity, shape, bonding, and alloy available |