Magnetron Sputtering and Thermal Evaporation Combo Coater

Research programmes that require both sputter-deposited films (high-density, adherent metal films, ceramic coatings) and thermally evaporated films (ultra-thin organic-compatible metal contacts, carbon coatings for TEM sample preparation) traditionally require two separate vacuum systems — at significant cost and bench space. The combo coater integrates both deposition modes in a single compact chamber, allowing the operator to switch between magnetron sputtering and thermal evaporation without cycling the vacuum. Both sources can be used sequentially in a single pump-down for multilayer deposition.

Technical Specifications

Typical Applications

• SEM sample preparation — sputter gold then carbon coat in one pump-down
• TEM sample preparation — carbon film deposition followed by metal grid coating
• Metal/carbon multilayer deposition for electrochemical research
• Dual-layer electrode structures requiring both sputter and evaporation steps
• Labs requiring both PVD methods in a space-constrained research environment

Discuss your multilayer deposition requirement with our engineering team — we will configure the correct source combination and deposition sequence for your application.